layer deposition

Mira otros diccionarios:

• Atomic Layer Deposition — Die Atomlagenabscheidung (engl. atomic layer deposition, ALD) ist ein stark verändertes CVD Verfahren zur Abscheidung von dünnen Schichten. Verschiedene Namen ein Prinzip, die Atomlagenabscheidung[1] Bezeichnung Abkürzung Atomic layer deposition… …   Deutsch Wikipedia

• Atomic layer deposition — (ALD) is a gas phase chemical process used to create extremely thin coatings. The majority of ALD reactions use two chemicals, typically called s. These precursors react with a surface one at a time in a sequential manner. By exposing the… …   Wikipedia

• Atomic Layer Deposition — Pour les articles homonymes, voir ALD. L’Atomic Layer Deposition (ALD) est un procédé de dépôt de couches minces atomiques. Le principe consiste à exposer une surface successivement à différents précurseurs chimiques afin d obtenir des couches… …   Wikipédia en Français

• Deposition (chemistry) — In chemistry, deposition is the settling of particles (atoms or molecules) or sediment from a solution, suspension and mixture or vapor onto a pre existing surface. Deposition generally results in growth of new phase and is of fundamental… …   Wikipedia

• Deposition — or Depose may refer to: Deposition (law), taking testimony outside of court Deposition (chemistry), molecules settling out of a solution Thin film deposition, any technique for depositing a thin film of material onto a substrate or onto… …   Wikipedia

• Layer by layer — (LbL)deposition is a thin film fabrication technique. The films are formed by depositing alternating layers of oppositely charged materials with wash steps in between. A simple representation can be made by defining two oppositely charged… …   Wikipedia

• Layer (electronics) — A layer is the deposition of molecules on a substrate or base (glass, ceramic, semiconductor, or plastic/bioplastic) . High temperature substrates includes stainless steel and polyimide film (expensive) [1] and PET (cheap). A depth of less than… …   Wikipedia

• Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v …   Wikipedia

• Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia

• Atomic layer epitaxy — (ALE), now more generally called Atomic Layer Deposition, is a specialized form of epitaxy that typically deposit alternating monolayers of two elements onto a substrate. The crystal lattice structure achieved is thin, uniform, and aligned with… …   Wikipedia

• Thin-film deposition — is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. Thin is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some …   Wikipedia